Germanium Surface Cleaning and Preparation Methods for Semiconductor Applications
Omschrijving
Germanium is gaining interest in the semiconductor
industry as a replacement channel material for high
mobility applications. Contamination directly
affects the device performance, yield and
reliability. Therefore, continued device scaling is
dependent on effective surface preparation including
effective contamination and particle removal of
germanium surface. Cleaning and preparation methods
for silicon surface have been extensively developed
over the past few decades. Germanium surface
cleaning and preparation is at its infancy and is
markedly different from that of silicon. This book
examines these differences and fundamentals involved
in germanium surface cleaning. This book also
proposes methods for basic germanium surface
cleaning and the basis for further process
development for professionals involved in surface
cleaning of semiconductor materials.
Ik heb een vraag over het boek:
‘Germanium Surface Preparation Methods - Kim, Jungyup’.
Vul het onderstaande formulier in.
We zullen zo spoedig mogelijk antwoorden.
